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Mapping Equipment - メーカー・企業8社の製品一覧とランキング

更新日： 集計期間:Dec 24, 2025～Jan 20, 2026
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Mapping Equipmentのメーカー・企業ランキング

更新日： 集計期間:Dec 24, 2025～Jan 20, 2026
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  1. ワイ・システムズ Tokushima//Testing, Analysis and Measurement
  2. 一般財団法人材料科学技術振興財団　MST Tokyo//Testing, Analysis and Measurement
  3. ユアサエレクトロニクス Kanagawa//Optical Instruments
  4. 4 アーカイブティップス 本社 Tokyo//Trading company/Wholesale
  5. 5 アイテス Shiga//Electronic Components and Semiconductors
企業ランキングへ

Mapping Equipmentの製品ランキング

更新日： 集計期間:Dec 24, 2025～Jan 20, 2026
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  1. PL Mapping Device YWafer Mapper RD8 ワイ・システムズ
  2. [TEM ED-Map] TEM Electron Diffraction Mapping Method 一般財団法人材料科学技術振興財団　MST
  3. PL Mapping Device ユアサエレクトロニクス
  4. 4 [Analysis Case] PL Mapping of Multicrystalline Silicon Solar Cells 一般財団法人材料科学技術振興財団　MST
  5. 4 Portable brain function mapping device NIRS [OctaMon] アーカイブティップス 本社

Mapping Equipmentの製品一覧

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[Example of TOF-SIMS] Wide-area image map

[Example of TOF-SIMS] Wide-area image map

Wide-area image map driven by stage! Introducing a measurement example that visualizes the distribution of magic.

We will introduce a case of TOF-SIMS that enables wide-area image map measurement by combining it with an electric stage. We conducted wide-area (30mm × 30mm) image mapping measurements by drawing with two types of black markers on a metal plate. It is difficult to distinguish between the two types of markers in optical images, but by confirming the image map with characteristic secondary ion peaks for each marker, we can visualize the distribution of the markers. Additionally, there are cases where detailed analysis results were obtained from spectra after wide-area image map measurements using TOF-SIMS. [Overview] ■ Standard measurements (beam scan measurements) target sizes of 500μm × 500μm or smaller. ■ By combining with an electric stage, wide-area image map measurements are possible. *For more details, please refer to the PDF document or feel free to contact us.

  • Contract measurement

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[Analysis Case] PL Mapping of Multicrystalline Silicon Solar Cells

[Analysis Case] PL Mapping of Multicrystalline Silicon Solar Cells

It is possible to non-destructively identify the location of defects in solar cell cells.

When light with energy greater than the bandgap of a solar cell is irradiated, carriers are generated, and some of them undergo radiative recombination. The light emitted during this process is called photoluminescence (PL). However, in areas where defects are present, carriers are trapped, resulting in reduced PL intensity. Therefore, by conducting PL mapping measurements, it is possible to non-destructively and easily identify defect locations. Below is an example of identifying defect locations through PL mapping measurements in multicrystalline silicon solar cell modules.

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  • Contract Analysis

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Phosphor Wafer Mapping Device YB4

Phosphor Wafer Mapping Device YB4

Measurement range up to 4 inches! A device capable of high-speed, high-density mapping.

The "Phosphor Wafer Mapping Device YB4" is a device that can perform high-speed, high-density mapping evaluation of phosphor materials using a transmitted light source. It can measure an area of 100×100mm or up to a maximum of 4 inches, and it also allows for optional switching to an LED light source (standard 447.5nm). Additionally, it is capable of measuring angular dependence (at a right angle of 45°) and transmittance. 【Features】 ■ Measurement of up to 4 inches is possible ■ Optional switching to LED light source available ■ Measurement of angular dependence is possible ■ Transmittance measurement is possible *For more details, please download the PDF or feel free to contact us.

  • Wafer
  • Other measurement, recording and measuring instruments

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Projection Mapping Case Study: "Nagoya Castle Night Event"

Projection Mapping Case Study: "Nagoya Castle Night Event"

Introducing examples of projects based on the concept of enjoying the essence of Japan through the five senses!

Our company was responsible for the projection adjustment of a massive historical scroll that expresses the past, present, and future of Owari Nagoya through a giant projection. A historical scroll inspired by the wall paintings created by Kanō school painters was projected onto the Honmaru Palace. Additionally, during the "Star Wars" lighting, we illuminated the venue with the iconic blue and red Star Wars colors and also projected special visuals. 【Case Details】 ■ Event Name: NAGOYA MEETS NEW HISTORY "Nagoya Castle Night Gathering by 1→10" ■ Location: Special venue at Nagoya Castle ■ Duration: 27 days *For more details, please refer to the related links or feel free to contact us.

  • Lighting for image processing

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[Analysis Case] Stress Evaluation by Raman Mapping

[Analysis Case] Stress Evaluation by Raman Mapping

It is possible to confirm the stress distribution in the sample cross-section.

The peaks in the Raman spectrum of single crystal Si shift to higher wavenumbers when compressive stress is applied to the sample and shift to lower wavenumbers when tensile stress is applied. This allows us to gain insights into the stress in Si. An example is shown where the distribution of stress in the cross-section of an IGBT (Insulated Gate Bipolar Transistor) was confirmed using Raman mapping.

  • Contract Analysis
  • Wafer

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[TEM ED-Map] TEM Electron Diffraction Mapping Method

[TEM ED-Map] TEM Electron Diffraction Mapping Method

This is a method for analyzing the orientation distribution of crystalline samples using electron diffraction in a transmission electron microscope (TEM).

By scanning the electron beam probe and measuring the electron diffraction patterns at each point, high spatial resolution crystal information can be obtained. This method allows for the acquisition of information on smaller crystal grains than the EBSD method in SEM. It is also referred to as ACOM (Automated Crystal Orientation Mapping) - TEM method. - Crystal grain size analysis is possible - Orientation measurement of the measurement area is possible - Observation of twin grain boundaries (corresponding grain boundaries) is possible - Extraction of specific crystal orientations is possible - Measurement of the rotation angle of adjacent crystal grains is possible - Evaluation of crystal grains larger than a few nanometers is possible

  • Contract measurement
  • Contract Analysis

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YWafer Mapper GS4

YWafer Mapper GS4

Photoluminescence and film thickness mapping measurement equipment for 2, 3, and 4-inch wafers for LED/LD production Wafer PL

Y Systems was established based on its achievements in measurement and evaluation technologies in research environments for blue laser diodes (LD) and light-emitting diodes (LED). In 2001, we commercialized the first unit of our current flagship product, the Y-Wafer Mapper, with our staff. We will continue to play a part in the cutting-edge technology of solid-state lighting.

  • Other inspection equipment and devices

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PL Mapping Device YWafer Mapper RD8

PL Mapping Device YWafer Mapper RD8

Customizable Wavelength Range: 200nm - 5nu Compatible Wafer Mapping Device Wafer PL Photoluminescence Multifunctional

The RD8 series wafer mapping device is designed to accommodate various wafer sizes and shapes with a maximum measurement area of 200×200 mm. Basic measurements include photoluminescence, epitaxial film thickness, wafer warpage, transmittance and reflectance, back-side illuminated phosphor analysis, and wafer thickness measurement. We also offer customized solutions to meet our customers' specific needs.

  • Other inspection equipment and devices

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YWafer Mapper RD8-WL

YWafer Mapper RD8-WL

Wafer mapping device with robot transport, multifunctional 200x200mm, RD8 series wafer PL

The RD8 series wafer mapping device is designed to accommodate various wafer sizes and shapes with a maximum measurement area of 200×200mm. Basic measurements include photoluminescence, epitaxial film thickness, wafer warpage, transmittance and reflectance, backside illumination phosphor analysis, and wafer thickness measurement, and we also offer customized solutions to meet customer needs.

  • Other inspection equipment and devices

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Brain function mapping device NIRS【OxyMon】

Brain function mapping device NIRS【OxyMon】

Monitoring brain activity using near-infrared spectroscopy.

The OxyMon (Octamon) brain function mapping/imaging device is a basic type of brain function mapping/imaging NIRS system from artinis, which is central to their NIRS products. Using near-infrared spectroscopy, it allows for non-invasive real-time observation of the oxidation displacement data of hemoglobin contained in cerebral blood flow. It enables real-time observation of brain activity during operator tasks or when a driver is maneuvering machinery.

  • Other measurement, recording and measuring instruments
  • others
  • Spectroscopic Analysis Equipment

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Portable brain function mapping device NIRS [OctaMon]

Portable brain function mapping device NIRS [OctaMon]

Portable near-infrared spectroscopy brain function mapping/imaging device

The portable brain function mapping/imaging device 【OctaMon】 is a highly portable brain function mapping/imaging NIRS system from artinis that excels in mobility. 【OctaMon】 uses near-infrared spectroscopy to non-invasively observe real-time data on the oxidation displacement of hemoglobin contained in cerebral blood flow. It consists of an 8-channel (2×4) sensor that covers the prefrontal cortex, and the subject wears a headband with the sensors attached for measurement. The measured data is transmitted via Bluetooth from a small transmitter to a control notebook PC, providing feedback to researchers. Subjects can observe brain activity in a more natural state without being restrained by cables or other equipment.

  • Other measurement, recording and measuring instruments
  • others
  • Spectroscopic Analysis Equipment

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PL Mapping Device

PL Mapping Device

Fully automatable! A device that enables comprehensive mapping.

The "PL Mapping Device" is an apparatus for performing photoluminescence and film thickness mapping measurements on 2, 3, and 4-inch wafers for LED/LD production. With an automatic XY stage and original multifunctional measurement software, comprehensive mapping can be conducted. Additionally, by connecting to an automatic wafer supply and storage mechanism, full automation is possible. 【Features】 ■ Capable of measuring 2, 3, and 4-inch wafers ■ Measurement of 1/4 cut wafers is also possible with options ■ Comprehensive mapping ■ Full automation is possible *For more details, please download the PDF or feel free to contact us.

  • Wafer
  • Other measurement, recording and measuring instruments

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EddyCus(R)TF map 2525 series

EddyCus(R)TF map 2525 series

Diverse mapping analysis is possible with user-friendly software!

The "EddyCus(R) TF map 2525 SR" is a non-contact sheet resistance mapping device capable of accurate mapping measurements of sheet resistance for low and high conductivity thin films. It features versatile mapping analysis through user-friendly software. It is suitable for mapping measurements of metal film layers, as well as monitoring the thickness of thin films and substrates. 【Features】 ■ Non-contact type ■ Real-time measurement ■ Mapping measurement of metal film layers (nm) *For more details, please refer to the PDF document or feel free to contact us.

  • Other measurement, recording and measuring instruments

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Infrastructure Data Mapping Device

Infrastructure Data Mapping Device

Visual data through mapping. ~Accurately and objectively sharing degradation information~

This product automatically identifies the coordinate position by aiming at the target location and inputting it. The obtained data is visualized in a map, allowing for accurate and objective sharing of deterioration information. *For more details, please refer to the PDF document or feel free to contact us.*

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  • Testing Equipment and Devices

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